April 3, 2006 – Applied Materials Inc. announced that Elpida Memory Inc., a DRAM manufacturer, has selected the Applied Centura AdvantEdge system in its recent fab investment cycle for all of its silicon etching applications, including next-generation high k and metal gate structures.
The AdvantEdge system is intended to provide process control to reduce critical dimension variation by up to 50 percent compared with other systems, according to an Applied Materials release. Multiple new AdvantEdge systems were shipped to Elpida’s new 300mm fab in Hiroshima, Japan, for the production of advanced 90nm-70nm DRAM chips.