Heidelberg Instruments announces sale of lithography system

May 12, 2006 – Heidelberg Instruments announced the sale of an advanced DWL400 maskless laser lithography system to the Institute of Optics, Information and Photonics (Max Planck Research Group) at the University of Erlangen-Nuremberg.

According to the company, the DWL400 system will be mainly used for direct writing of microstructured optical elements and materials.


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