May 4, 2006 – SEMATECH has appointed Michael Lercel as director of its lithography division, replacing former director Kevin Kemp who was an assignee from Freescale Semiconductor since 2002 and is returning to his work there.
As head of SEMATECH’s litho program, Lercel will manage a 60-person organization involved in projects including 193nm immersion and extreme-ultraviolet (EUV) lithography, as well as programs in photoresist and mask strategy, and the organization’s technology development center at SEMATECH North in Albany, NY.
Lercel joined SEMATECH in May 2005 as an assignee from IBM Microelectronics, having served as IBM’s advisor to SEMATECH’s lithography division since 2003. At IBM he previously managed lithography R&D at the company’s semiconductor R&D center in Hopewell Junction, NY, and was a manager at IBM’s advanced mask facility in Burlington, VT.
Kemp replaced former Director Giang Dao, who was promoted last spring to SEMATECH’s COO – Advanced Technologies. On assignment to SEMATECH since 2002, Kemp initially served as manager of the consortium’s EUV program, and was instrumental in launching SEMATECH’s EUV projects in Albany, NY.
SST spoke with Lercel at the recent SPIE Microlithography conference. Click Here to view the on-camera conversation.