May 25, 2006 – SEMATECH and the U. of Queensland, Brisbane, Australia, have agreed to codevelop new resists for 193nm immersion lithography, in an effort to extend immersion technology for multiple generations.

The two groups plan to identify and qualify high-refractive-index polymers for 193nm photoresists, part of a broader SEMATECH program to extend immersion litho across three categories: resist, immersion fluids, and lens materials. The Australian government, through its Australian Research Council agency, will support the project with a two-year, $510,000 grant, matched by SEMATECH with cash and contributions including access to SEMATECH’s Immersion Technology Center, as well as project management and logistical resources.

“One of our basic objectives at SEMATECH is to maximize the world’s R&D resources through leverage and creative partnerships,” stated Michael Polcari, SEMATECH president and CEO. “This agreement with ARC certainly exemplifies that aim, and allows us to share expertise with a region that is seeking to become a world leader in microelectronics.”

“The partnership between SEMATECH and the U. of Queensland already has yielded many interesting material platforms, and this grant from the ARC will permit the further research needed,” added Will Conley, a Freescale assignee to SEMATECH.