Veeco, Fluens develop PVD for data storage

May 2, 2006 – Veeco Instruments Inc., Woodbury, NY, said it has made an undisclosed investment in developing a new physical-vapor deposition (PVD) technology with Fluens Corp., Billerica, MA, targeting data storage applications.

The technology involves a new process for high-rate PVD of aluminum oxide, offering high reaction rates, low film stress, and high growth rates. Initial shipments of a high-throughput alumina PVD module, built on Veeco’s Nexus platform, are expected in 1H07.

Robert Oates, SVP for Veeco’s process equipment division, added that the company plans to make the module clusterable with other Nexus etch and deposition products, to apply to customers’ wafer-level thin-film magnetic head manufacturing processes.


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