NanoInk and SII Nanotechnology announce photomask repair agreement

June 23, 2006 — NanoInk Inc. and SII NanoTechnology Inc. (SIINT), a subsidiary of Seiko Instruments Inc., announced that they have signed an exclusive licensing agreement to provide nanoscale repair solutions to the photomask industry. The two companies will collaborate on projects that will involve modification of NanoInk’s proprietary dip pen nanolithography (DPN) technology to be integrated with SIINT’s photomask repair instruments and nanomachining platforms. Financial terms of the agreement were not disclosed.

Photomask repair industry challenges are tied to smaller defects that cannot be addressed with current options. Both companies anticipate that with computer chip nodes going down in size to 65 nm and 45 nm, the photomask repair industry requires capabilities that are available only with new technology provided by NanoInk’s DPN.


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