NanoInk, SII ink photomask repair pact

June 26, 2006 – NanoInk Inc. and SII NanoTechnology Inc. have signed a deal to provide nanoscale repair solutions to the photomask industry, involving modification of NanoInk’s dip-pen nanolithography technology to integrate it with SII’s photomask repair instruments and nanomachining platforms. Development work will be performed in the US and Japan; terms of the deal were not disclosed.

Through the deal, SII gains access to “a solid global IP portfolio” through partnership with a cutting-edge US-based nanotechnology company, stated Hiroyuki Funamoto, president and CEO. Cedric Loiret-Bernal, president and CEO of NanoInk, added that codesign and development of a platform that can integrate repair capabilities will “raise standards for repair within the photomask industry.”


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