Entegris launches immersion litho lens system

July 11, 2006 – Entegris Inc. announced the introduction of its LiquidLens UPW (ultrapure water) purification system. The company says the immersion lithography innovation combines advanced technology and process expertise from both Entegris and the former Mykrolis as a result of their merger in August 2005.

The LiquidLens system is intended to provide the highest water purity level at the temperature and pressure required. Entegris says it has delivered several LiquidLens systems for evaluation and process development use to several major customers. According to Entegris, these leading companies are turning to the LiquidLens system to ensure that precisely controlled UPW is provided to advanced lithography processes as the companies move to production.

Immersion is the newest lithography technique for printing 45 nm or smaller features on semiconductor wafers, using ultra pure water between the optical lens and the wafer. The UPW lens is utilized to significantly improve image resolution. The water must be extremely pure as the smallest impurity can damage image resolution, react with the photoresist, or contaminate the lens.

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