Ibis puts 2nd SIMOX sale on the books

August 30, 2006 – Ibis Technology Corp., Danvers, MA, says that Sumitomo Mitsubishi Silicon Corp. (SUMCO) has given final approval to its second i2000 oxygen implanter, received earlier this year, allowing Ibis to recognize approximately $7 million in the current fiscal quarter.

SIMOX (separation-by-implantation-of-oxygen) refers to a technique used to manufacture SOI wafers, using an oxygen implanter and an annealing process to create a thin insulating layer within the wafer, just below a thin layer of silicon on the top of the wafer. The company claims the SIMOX-SOI wafers offer several benefits for use with advanced semiconductor processing, notably reducing heat generated through electrical leakage within devices.

Ibis president and CEO Martin Reid indicated the company anticipates additional orders in 2006, but did not confirm any at this time, adding that any orders would be recognized in 2007 and beyond.


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