August 28, 2006 – Nanophase Technologies Corp. and Rohm and Haas Electronic Materials’ CMP technologies unit have extended a partnership for use of new nanomaterials and nanomaterial dispersions for semiconductor polishing (chemical mechanical planarization) applications through 2019, to develop nanomaterial-based slurries for current and future semiconductor fabrication technology nodes. Rohm and Haas also has purchased roughly $5 million worth of shares in Nanophase in an all-cash transaction, giving it a 4.5% ownership stake.
Joseph Cross, Nanophase’s president and CEO, noted the two companies have worked together for four years, and he hopes to continue to support Rohm and Haas’ market offerings of pads, conditioners, and slurries.
“We believe that this long-term deal with Nanophase is instrumental in growing our CMP slurry business,” stated Nick Gutwein, president of Rohm and Haas Electronic Materials, CMP Technologies. “Over the past few years we have developed a solid relationship that resulted in innovative slurry products for the STI market. So we are enthusiastic about continuing this alliance for years to come.”