Fujitsu, Advantest form e-beam litho JV

September 15, 2006 – Fujitsu Ltd. and Advantest Corp. plan to collaborate on development of an electron beam direct lithography to use in semiconductor manufacturing using Fujitsu’s 65nm and 45nm process technologies.

Terms of a formal contract for the JV are still being discussed, but it is expected to launch in November, with Fujitsu the majority owner (55%), and working out of Fujitsu’s current facilities.

Advantest will develop new e-beam exposure systems for the JV, which will develop process technologies suited to e-beam direct lithography. The companies aim to provide a prototype shuttle service in fiscal 2007 using the e-beam litho technology, for 300mm/65nm process technology and eventually 45nm.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.