Nanometrics, ASML to cross license advanced overlay, control systems

Oct. 26, 2006 — Nanometrics Inc., a Milpitas, Calif., supplier of advanced integrated and standalone metrology equipment to the semiconductor industry, announced it has entered into a cross-licensing agreement with ASML, the provider of lithography systems for the semiconductor industry based in Veldhoven, the Netherlands.

The agreement reflects the commitment to offer customers extendible, open-architecture Overlay and CD control solutions that scale beyond 32nm, according to statements by John Heaton, Nanometrics’ president and CEO.

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