Nanometrics sues Nova again over scatterometry patents

October 12, 2006 – Nanometrics Inc. has filed a new complaint in US District Court in Northern California against Nova Measuring Instruments Ltd., alleging infringement of patents relating to optical critical dimension technology (“scatterometry”). Specifically, the patents involve a “Method for Broad Wavelength Scatterometry” (US Patent #5,867,276) and an “Apparatus and Method for the Measurement of Diffracting Structures” (US Patent #7,115,858 B1).

“When we merged with Accent Optical, we acquired a number of patents and other fundamental intellectual property in the field of scatterometry, including the patents that are the subject of this new complaint,” stated John Heaton, president and CEO of Nanometrics. “As a result, we are now in a stronger position to protect our proprietary technology from infringement.”

Earlier this year, Nanometrics filed other patent litigation against Nova over technology in its UV reflectometry and optical critical dimension tools.


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