UMC and IME to partner on advanced noise modeling for nanometer technologies

Oct. 3, 2006 — UMC, a global semiconductor foundry, and Singapore’s Institute of Microelectronics (IME), have sealed a partnership to jointly develop Radio Frequency modeling solutions for 90nm technologies. The cooperation is intended to result in the development of new methodologies that are applicable for advanced technologies at 90nm and beyond.

The newly formed joint development program encompasses two areas of research: high frequency noise characterization and modeling for RF applications at nanometer process technologies, as well as circuit modeling verification and validation flow development based on IME’s RF circuits and tests.

Progress in these areas could help facilitate the development of a Mixed Mode (MM)/RF circuit and a modeling validation methodology for advanced system-on-chip (SoC) applications. These resources could help accelerate design-in and reduce risk for customers developing SoCs that incorporate RF applications for wireless segments such as 3G, WLAN and Bluetooth.

The joint efforts will take place at UMC’s 300mm Fab 12i in Singapore. Fab 12i was Singapore’s first 300mm fab, and features advanced automation systems and equipment such as state-of-the-art single wafer processing. The partnership will give IME access to Fab 12i’s facilities and resources.


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