Applied’s HKMG is ready when you are

by Ed Korczynski, Senior Technical Editor

The IEEE and Applied Materials recently co-sponsored a one day seminar on high-k dielectrics and metal gates, with researchers from AMD, Freescale, IBM, Toshiba, Xilinx, and SEMATECH presenting their experiences integrating HKMG materials into CMOS transistors, and showing that these newer materials are ready for low-standby power IC applications. The event was held in the ostentatious splendor of San Jose’s Hotel Valencia, with ‘ultra-lounges’ made ‘ultra’ by the high-tech electronics we came to discuss.


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