Grant making refrigeration system for Vistec e-beam nano-lithography machine

Nov. 1, 2006 — Vistec Lithography, a Cambridge, England, developer of electron beam lithography systems for the semiconductor industry, announced that it selected Grant Technologies, a designer and manufacturer of custom scientific and industrial solutions, to develop a refrigeration system to cool the lens, chamber and handling system within its VB300 electron beam nano-lithography machine.

Vistec Lithography’s VB300 electron beam system is designed for use in advanced production and R&D applications to create the ultra-fine images used in the semiconductor and nanotechnology industries. The system has the ability to load and fully expose substrates up to 300mm in diameter and mask plates up to 7 inches square with a lithographic capability to the sub-10nm level. These applications are undertaken by customers for the development of the next generations of nano-devices and structures, at major semiconductor manufacturers, industrial R&D facilities, as well as at universities and other technology centers of excellence.

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