Nov. 27, 2006 — Heidelberg Instruments announced the sale of an advanced DWL200 maskless laser lithography system to the Angstrom Microstructure Laboratory of the University of Uppsala, Sweden.
The DWL200 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm.
“The DWL 200 lithography system will constitute an important upgrade of the in-house mask making and direct writing capabilities at the Angstrom Microstructure Laboratory (MSL),” said Stefan Nygren, lab director of the Angstrom Microstructure Laboratory, in a prepared statement. “The MST / MEMS activities at this multidisciplinary resource for micro- / nanotechnology and materials science span from life science to space applications, with a critical need for fast turnaround cycles. The new system is equally important to strengthen MSL as a national node for academic mask fabrication in Sweden.”