TEL preps 300mm wet station

November 29, 2006 – In another announcement leading into next week’s SEMICON Japan, Tokyo Electron Ltd. says it will start production shipments of its Expedius + 300mm automated wet station in January.

The system is design for leading-edge FEOL cleans, etch, and resist strip for 300mm/45nm volume manufacturing, with output of up to 600 wafers/hour, and a 20% smaller footprint than the previous version. It also features TEL’s Ingenio technology for real-time collection of tool data and analysis.


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