FEI to introduce NanoLab 400/400S

Dec. 1, 2006 — FEI Co. of Hillsboro, Ore., announced it will expand its Helios NanoLab family of DualBeams when it introduces the Helios NanoLab 400 and 400S systems next week at SEMICON Japan.

The systems combine focused ion beam (FIB) and scanning electron microscope (SEM) technologies in a single platform that is designed to provide semiconductor manufacturers with a complete range of advanced high-resolution solutions for their analytical labs.

The Helios NanoLab family features a new ultra-high resolution field emission SEM column combined with FEI’s Sidewinder FIB column and gas chemistries to provide up to 40 percent improvement in imaging resolution compared to previous DualBeam systems, according to FEI. These systems feature greatly enhanced low-kV SEM resolution to support cross-sectional imaging and analysis and advanced STEM applications for devices featuring new materials and sub-65 nm design nodes. They also provide enhanced stability and optimized operation within a wide range of parameters.

The Helios NanoLab 400 offers an advanced high resolution stage and load lock and the 400S is equipped with a flip stage for highly precise sample localization to bridge the SEM-TEM gap. The 600 system, introduced earlier this year, offers a larger stage for versatile sample handling.


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