KLA-Tencor tips new litho optimizer

February 23, 2007 – KLA-Tencor says the new version of its PROLITH litho optimization product, PROLITH 10, enables users to accurately predict lithography process windows for integrated circuit (IC) designs down to 32nm.

The software enables detailed, predictive model-based OPC, with next-generation shape definition, for immersion lithography-based designs to provide design-for-manufacturing (DFM) insight early in the development cycle, according to the company.

Used as a virtual lithography cell, PROLITH 10 offers designers and process engineers powerful, predictive accuracy to quickly experiment with a wide variety of lithography process and OPC conditions and corrections, even before resists or scanners or other tools are available for a new node, the company says.


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