SPIE keynotes dismiss EUV

by Ed Korczynski, senior technical editor

The organizing committee of SPIE Advanced Lithography Symposium — the conference formerly known as “Microlithography” — probably didn’t plan for the Monday (Feb. 26) keynote addresses to dismiss EUV lithography, but that’s exactly what happened. Prior to three days of detailed EUV presentations, executives presented perspectives that do not include place for this next-generation lithography technology any time in the near future.


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