Integration extends 193nm litho

by Ed Korczynski, Senior Technical Editor

As thoroughly reported by WaferNEWS, SST, and Microlithography World, the 2007 SPIE lithography meeting detailed that 193nm wavelength lithographic reduction steppers may be the last mainstream lithographic technology for the semiconductor manufacturing industry. Process development engineers now look for ways to create ever smaller device features using 193nm litho with clever combinations of other known unit-process steps: thin-film depositions, etches, and plasma surface treatments.


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