Common Platform alliance trumpets 45nm DFM

June 5, 2007 – The Common Platform technology alliance of IBM, Chartered Semiconductor Manufacturing, and Samsung Electronics Co. Ltd. have announced availability of DFM technology model, data files, and design kits from various partners supporting its 45nm process technology (as well as its 65nm process).

The 45nm DFM offering incorporates a range of capabilities, including DFM tools from Mentor Graphics (critical area analysis and critical feature analysis) and a silicon-validated CMP Predictor from Cadence Design Systems.

“At 45nm, DFM is integral in linking design, process flow, and manufacturing, giving designers more control and predictability over the outcome for robust variation-aware designs,” explained Ana Molnar Hunter, VP of technology at Samsung Semiconductor Inc.


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