June 22, 2007 — The Fraunhofer Center Nanoelectronic Technologies (CNT) has begun using Vistec SB3050, Vistec Electron Beam GmbH‘s leading edge lithography system. The tool enables direct patterning down to the 32nm technology node for fast prototyping, design evaluation, and R&D.
Fraunhofer CNT uses the system for electron-beam direct write. Vistec SB3050 differs from the previous tool generation by a significantly improved 50 kV electron-optical column.
“Thanks to Electron Beam Direct Write’s high degree of flexibility and its excellent resolution performance it is already possible to develop processes for emerging technology levels — today. The installed Vistec system will enable our partners to shorten time to market and allow early evaluation of innovative processes and technologies – an example of CNT´s mission of ‘docking research into manufacturing'”, explains Professor Peter Kuecher, CNT director.