Trio to collaborate on e-beam tech for sub-10nm devices

June 4, 2007 – GenISys GmbH, JEOL Ltd., and Cornell U. are partnering to develop advanced technologies for direct-write e-beam data preparation and electron process correction technologies for nanometer-range structures.

Under the partnership, GenISys will optimize its Layout Beamer data prep and PEC software for JEOL’s high-end e-beam litho systems. Cornell’s Nanoscale Science and Technology Facility will provide guidance for both implementation and development strategies.

The group says work has been in progress for six months focusing on 10nm-or less structures, which are fabricated with a few pulses of the e-beam writer. Results of the work have led to upgrading the GenISys software with an algorithm to correct printing artifacts of the discrete writing grid, and future versions will account for additional machine and process effects.

“Users of e-beam direct write need urgent solutions for advanced data preparation and correction for nanostructure applications,” said Ulrich Hofmann, founder and general manager of GenISys, in a statement. “These organizations are pioneering the state of the art in nano-fabrication and provide the ideal forum for further development and extension of Layout Beamer. The high flexibility, responsiveness and unique combination of software and e-beam application knowledge will enable GenISys to deliver the solutions the market is waiting for.”

“With more than 700 users coming to our facility annually, we do a vast amount of e-beam data preparation, and this collaboration will help us provide better service and results, as well as learn more about the future of the process,” added Rob Ilic, research associate and user program manager of Cornell’s Nanoscale Science and Technology Facility.


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