Under the hood of IBM’s HK+MG gate-first processing

by Ed Korczynski, Senior Technical Editor

In an exclusive interview with WaferNEWS, Mukesh Khare, project manager for IBM’s high-k/metal-gate development, discusses details of the company’s new high-k/metal-gate (HK+MG) transistor technology, a “gate first” approach that keeps the same processing sequence used by traditional SiON gates, allowing for both technologies to be run on the same line and minimizing integration costs. “We picked the approach that is simple, scalable, and also migrate-able,” he explained.


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