Akrion to ship 300 mm single-wafer system for advanced process development to IMEC

June 19, 2007 — /PRNewswire/ — ALLENTOWN, PA — Akrion, Inc. will ship a 300 mm single-wafer Velocity surface preparation system to IMEC, Europe’s leading independent nanoelectronics research center facility in Leuven, Belgium.

The four-chamber Velocity(4) will be used to develop and test new back- and front-end-of-line process recipes for IC device manufacturing at the 32 nm technology cycle. Akrion’s Velocity uses patented stacked process chambers to minimize footprint. The system offers full 300 mm factory automation compliance and a wide range of advanced technologies focused on the use of controlled physical forces to minimize physical damage while providing very effective cleaning. Available subsystems include: patented Goldfinger(R) megasonics, JetStream(TM) and JetStream-Nano(TM) spray technology, as well as Sahara(TM) surface-tension-gradient dryers.

“We are pleased that IMEC will use our Velocity system to develop expanded process capability. Our previous partnership experiences have all been very positive, including the development of our single-wafer dryer, Sahara(TM),” says James S. Molinaro, Akrion president and CEO.

About Akrion
Akrion is a leading provider of semiconductor surface preparation systems, including single-wafer and batch-immersion cleaning tools for the semiconductor manufacturing industry. The company’s products are used in the production of a diverse range of devices, including integrated circuits for DRAM, NAND flash, logic, and MEMS as well as new and reclaimed semiconductor wafers, and photomasks. Headquartered in Allentown, PA, Akrion’s Allentown production facility is ISO 9001:2000 and ISO 14001:2004 certified. For further information, please visit Akrion’s Web site: http://www.akrion.com/.

Source: Akrion, Inc.

Contact:
James Whittle, CFO of Akrion, Inc.
Tel: 610-530-3358

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