July 18, 2007 – Keithley Instruments Inc. and European R&D institute CEA-Leti have agreed to jointly research methods for characterizing advanced semiconductor materials and devices that support DC, high frequency, and RF-level signals on both micro- and nano-level structures. Under the deal, Keithley’s RF-enabled semiconductor test equipment will be installed at CEA-Leti’s facilities.
“As semiconductor technology pushes the upper limits to achieving RF-level signals and device miniaturization to nano levels, measurement technology must not only keep pace but even lead researchers’ ability to build and test these devices,” said Mark Hoersten, Keithley VP of business management, in a statement. “Our partnership with CEA Leti is a unique opportunity to create new measurement technology at the point where many of our customers’ technologies converge: semiconductor, RF/wireless, and nanotechnology.”
“The ability to make high quality electrical measurements is crucial to advance the ‘More Moore’ and ‘More Than Moore’ initiatives forward,” stated Olivier Demolliens, head of the nanotech division at CEA Leti. “Our electrical experts need the finest data to understand, model, and improve our devices. The partnership with Keithley makes it possible to help develop and boost the measurement technology to coincide with the needs of research and industry experts.”