July 19, 2007 – Amid a batch of product rollouts this week, Entegris Inc. has unveiled a new line of high-flow liquid filters for sub-45nm contamination control, and an add-on to its 193nm litho reticle haze tool targeting deep-ultraviolet lithography.

The Torrento family targets liquid contamination control of nanoscale particles in wet etch and clean manufacturing processes. The filters incorporate a membrane technology with 20nm pore size rating, and a non-dewetting surface technology for use in a high-flow recirculated bath “with aggressive aqueous chemistries,” the company says.

Meanwhile, Entegris also rolled out this week its RSPX manual purge station, an add-on to its Clarilite system released earlier this year that provides a continuous cleansing environment using purified gas to prevent reticle haze in 193nm lithography. The RSPX station can hold up to 10 pods with phase-shift masks, is RFID-capable, and can also operate as a standalone unit with integrated purge.

The Clarilite system and RSPX add-on aim to help manufacturers control the cost of reticle defects caused by haze, which “can be exorbitant” and are “an acute problem in fabs with deep ultraviolet lithography tools,” said Bill Shaner, president and GM of Entegris’ microenvironments business, in a statement.