July 18, 2007 – Vistec Semiconductor Systems says it will combine its electron beam and lithography business groups in order to “better meet customers’ requirements and improve synergy across the organization.”
Vistec Electron Beam Lithography Group, with European and US locations, is composed of the company’s electron beam group focused on shaped-beam technology for lithography equipment; and lithography group with equipment based on Gaussian beam technology. The company claims it “remains deeply committed” to strengthening its e-beam litho business, which will continue to be based in Jena, Germany. The Gaussian-beam litho unit’s Cambridge, UK operation will be moved to Albany, NY, per an earlier annoucement.
Additional reporting by Advanced Packaging