August 3, 2007 — First Nano, a division of CVD Equipment Corp., has shipped its first EasyTube 6000 chemical vapor deposition system. The multi-tube EasyTube 6000 horizontal system, specifically designed for the research, university, and laboratory market, is capable of processing up to 100 wafers of 6″ diameter or less. The system is available with processes for research in the semiconductor, MEMS, nanotechnology, and solar cell markets.
First Nano says its line of EasyTube systems offer researchers quality performance, safe operation, and production grade equipment at a low cost. All EasyTube systems come with the company’s proprietary WINPRC real-time software to enable optimization of all process parameters. The EasyTube 6000 has a small footprint, is modular in design, and is offered with atmospheric and low- pressure chemical vapor deposition processes.
In Q4 2007, First Nano plans to install an EasyTube 6000 in its “Open Laboratory” to further our ongoing relationships with the research community. The system will be used for customer demonstration, material processing, and developing additional processes for CNT, solar and MEMS applications. The addition of this system makes for a total of nine operational deposition systems in the company’s lab for further product and materials development.
: