Intel finds signs of heterogeneous life after silicon

by Ed Korczynski, Senior Technical Editor

High-k and metal-gates (HK+MG) has been touted as the biggest change in semiconductors in 40 years, but as we approach the limits of silicon channels for CMOS circuits, compound semiconductors are being reconsidered as building blocks for mainstream ICs — and that will be a far greater integration challenge. Enter Intel researchers, who now say they’ve passed a milestone along the road many travel to heterogeneous integration: integrated superior device performance.


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