OAI adds nano imprint lithography option for mask aligners

August 1, 2007 — OAI (Optical Associates Inc.) says that it has added to its mask aligners nano imprint lithography with sub-20 nm resolution. Working with Nanolithosolution Inc. (NLS), OAI is offering a nano imprint module as an option for all of the company’s mask aligners — which can then be used as imprint systems or as standard mask aligners (the module can be easily removed at any time). The module can be included with new orders or retrofit onto existing systems. It comes complete with wafer and mask holder and a nano imprint controller to control the process steps. OAI also supplies a complete starter kit of materials.

OAI’s nano imprint module was developed by HP after years of research and development. “After extensive comparisons, OAI chose the HP process due to its one-step Auto Release which simplifies the imprint process, said OAI president Dr. Charles Turk. Turk explained that OAI mask aligners are known for their flexibility and the imprint modular approach extends the value of OAI’s mask aligners.

OAI previously announced the Contact Liquid Photopolymer (CliPP) module for microfluidics. This additional module for nanotechnology clearly sets the OAI mask aligners apart from its competitors, the company asserts.

OAI has designed and manufactured standard and specialized precision mask aligners, UV exposure systems and custom-engineered systems for over 30 years. The company maintains full sales, service, and engineering offices worldwide.


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