Dongbu HiTek readying 110nm CMOS image sensor work

September 12, 2007 – Korean foundry Dongbu HiTek says it has made available a new internally developed design library to support manufacturing of CMOS image sensors using 110nm process technologies.

The technology offers 30% reduction in feature sizes vs. the firm’s a 0.13-micron CIS library, which released in April of this year, and enables low leakage current in standby status as well as up to 5-megapixel resolution in camera phones, the company said in a statement.

Final reliability testing will be completed over the next several months, followed by a production ramp, according to Joon Hwang, EVP in charge of the foundry’s CIS development work.


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