ASMI licenses ALD to Hitachi Kokusai

November 28, 2007 – Hitachi Kokusai Electric has agreed to license ASM International’s patents for batch atomic layer deposition (ALD) technology, to bolster its own work in the technology. Terms of the deal were not disclosed.

“We believe it is in the best interest of the semiconductor industry to license this technology and allow another supplier to join us in serving the rapidly growing need for cost-effective ALD processing capabilities,” said ASMI GM Albert Hasper, in a statement.

Wall Street analysts speculated earlier this year that ASMI was the likely ALD tool supplier for Intel, used for its high-k/metal gate (HK+MG) technology in its new 45nm process.


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