Nikon boosts throughput in upgraded i-line stepper

November 29, 2007 – Nikon is uncrating a new i-line stepper that it says exceeds 200 wafers/hr throughput, targeting use in sub-critical layers in volume production of memory and microprocessor devices.

The NSR-SF155, an upgrade from the NSR-SF150, boasts 200 WPH “or greater” with <25nm overlay accuracy, achieving the same wide exposure field as DUV scanners, the company says. It incorporates the company's "Skyhook" technology to eliminate effects of ground and stage vibrations, as well as new stage countermasses and improved temperature stabilization in the chamber.

The NSR-SF150 previously was touted as able to print 180 300mm wafers/hr, according to a Nikon exec speaking this year’s SEMICON West.


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