December 10, 2007 — NIL Technology has further increased the availability of cost-efficient nanostructures for nanoimprint lithography (NIL). Last year the company introduced nickel standard stamp with structures as small as 100 nm, and thereby made available NIL beyond large conglomerates to researchers and engineers. Now the company has introduced its second standard stamp, in quartz (fused silica) and silicon, with features as small as 50 nm.

“We have shown that there is a large market for standard stamps”, says managing director Theodor Nielsen. “With the introduction of the Quartz and Silicon standard stamps we now cover a wide market need and this time with structures down to 50 nm.”

Nanoimprint lithography (NIL) is an economically efficient production technique for sub-100 nm structures. NIL Technology has priced its Qz and Si stamps at 4900 Euros.