With shrinking design rules, MEMS devices must be produced with higher precision and accuracy to ensure reliability and the required performance. With an accuracy of 0.2 micron at 3 sigma, the DSM system demonstrates excellent measurement results in automated mode. Working in concert with the SUSS Compact series mask aligner, these two machines represent the perfect package for double-sided alignment and exposure applications frequently used in the manufacturing of MEMS, power semiconductors and optoelectronic devices.

(January 17, 2008) AUSTIN — Freescale Semiconductor has established an advanced microelectromechanical systems (MEMS) 200-mm (8-inch) production line to address growing sensors market demand. The newly added line at Freescale’s Oak Hill Fab in Austin, TX, complements the company’s existing 150-mm (6-inch) MEMS capacity in Sendai, Japan.