Jan. 11, 2008 – IBM and Central Glass have agreed to jointly explore use of fluoromaterials (materials that contain fluorine atoms) in developing photoresist materials for future semiconductors.

Photoresist materials traditionally use acrylic resins, but at the 32nm node resist materials are expected to utilize larger amounts of fluorine compounds for greater transparency, notes the Nikkei Business Daily. The two companies’ work will focus on optimal fluorine mixing ratios and compositions, an area in which the Japanese firm has experience (semiconductor fluoride gases).

Fluoromaterials are key to advances in immersion lithography, and also show promise for nano-membrane materials in environmental applications such as water purification or desalination, noted IBM in a statement.

Central Glass has sent researchers to IBM’s Almaden Research Center in San Jose, CA, and will mass-produce the resist materials at its plant in Kawasaki. No timeline was given.