February 26, 2008 — Rudolph Technologies Inc. a provider of process characterization equipment and software for thin film measurement and macro defect inspection, and Sematech, the global consortium of leading chipmakers, has announced that Rudolph has become the first semiconductor equipment supplier company to join Sematech’s Metrology Program headquartered at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.
Under the membership agreement, Rudolph and Sematech will jointly establish an International Process Characterization (IPC) program, aimed at the development of process, analysis, and characterization technology to address critical challenges in nanoelectronics research.
The IPC program, which will be a foundational component of Sematech’s expanding metrology programs at CNSE’s Albany NanoTech complex, brings together expert researchers and technologists, along with critical tools and software, as part of the consortium’s broader industry-university-government partnership with New York State and CNSE.
As the first associate member, Rudolph will team with Sematech’s members and the members of ISMI (International Sematech Manufacturing Initiative) to accelerate the development and application of measurement methods for advanced semiconductor technologies.