IBM, Matheson to develop ≤32nm chip gases

Apr. 29, 2008 – IBM and Matheson Tri-Gas, a subsidiary of Japan’s Taiyo Nippon Sanso, have signed a four-year deal to jointly develop new high-purity gases and delivery systems for use in semiconductor manufacturing starting at the 32nm node. R&D work will be conducted at the College of Nanoscale Science and Engineering’s Albany NanoTech Complex. Mass production of the materials is set to start in 2012.

The joint work, combining Matheson/Taiyo Nippon’s gases and purification equipment with IBM’s CMOS R&D capabilities, “enables both companies to accelerate the pace of semiconductor innovation,” said Bernie Meyerson, VP of strategic alliances and CTO for IBM’s systems and technology group, in a statement.

Bill Kroll, president/chairman/CEO of Matheson Tri-Gas, added that the partnership “sends a clear message to the global semiconductor community that the collaborative model that IBM and its partners have chosen is attractive for partners specializing in material, chemical, and gas based solutions.”


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