April 25, 2008 — Tohoku University of Japan has joined the network of Finland’s Picosun Oy, developer of tools for the nanotechnology application of atomic layer deposition (ALD). “Our co-operation will lead to new results in implementation of ALD in nanotechnology applications and further strengthen the market position of our SUNALE ALD process tools in Japan,” stated Juhana Kostamo, Managing Director of Picosun Oy.

ALD, a gas phase chemical process, is used to create extremely thin coatings for various applications including MEMS and CMOS manufacturing.

According to Professor Makoto Kohda of Tohoku University, “In semiconductor spintronics, gate controlled spin manipulation and its device application are one of the important technologies for realizing spin based functional devices. AI2O3 formed by SUNALE R-75BE ALD-reactor system enables us to realize pin-hole free and thinner gate insulator on top of semiconductor two dimensional electron gas and shows excellent device characteristics.”

Professor Junsaku Nitta’s Quantum and Materials Science Laboratory at Tohoku University studies a new paradigm: electronics based on the spin degrees of freedom of the electron requiring a way of controlling electron spins in semiconductor channels by using gate bias voltage.

“Picosun possesses 30 years experience in ALD technology . . . More and more customers in need of high-quality ALD tools both in industry and academia are now choosing Picosun as their partners,” stated Hiroshi Sato, General Manager of Altech Co., Ltd.

Picosun, part of Stephen Industries Inc. Oy, is an international equipment manufacturer with world-wide sales and service organization. Picosun develops and manufactures Atomic Layer Deposition reactors for micro- and nanotechnology applications. Based in Espoo, Finland, the company has its US headquarters in Detroit, Michigan. Dr. Tuomo Suntola, inventor of ALD technology, is Chief Scientific Advisor and member of the board of directors of Picosun.