SUSS MicroTec To Develop Nano Imprint Technology with Philips Research

(April 29, 2008) Munich, GERMANY &#151 SUSS Microtec and Philips Research, Eindhoven, Netherlands, announced a license agreement to develop an enabling technology called substrate conformal imprint lithography (SCIL). The intention is to bring existing equipment platform with additional nanoimprinting (NIL) feature to the market, enabling new approaches to large-area imprint applications.


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