Apr. 29, 2008 – Suss MicroTec and Philips Research say they are partnering to develop a new nanoimprint lithography technology targeting a niche in sub-50nm patterning between small rigid stamps and larger soft stamps.
The technology, dubbed “substrate conformal imprint lithography” (SCIL), “bridges the gap” between small rigid stamps used for top resolution, and large-area soft stamps with limited printing resolution below 200nm. It offers “the best of two worlds,” they say — large-area imprint capabilities with repeatable printing capability, no stamp deformation (no contact force is applied), non-UV-based room-temperature curing, and high aspect ratios up to and exceeding 1:5.
Suss’ lab aligner platform, which handles 150mm-200mm UV lithography, will be upgraded to accommodate the new technology; samples are available now, with market introduction scheduled for later this year.
“SCIL represents an enabling new technology that paves the way for further commercialization of nanoimprint lithography”, said Rolf Wolf, GM of SUSS’ lithography division, in a statement. “This collaboration with Philips Research significantly broadens the range of nanoimprint lithography processes we can offer our customers.”