May 1, 2008 – Three segments of thin-layer deposition will see their growth rates increase over the next six years, with the top two (CVD and ion implant) enjoying the best growth over the period, according to data from BCC Research.

All three market segments — chemical vapor deposition (CVD) ion implantation, and molecular beam epitaxy (MBE) — are expected to grow roughly the same in 2008 (4.0% vs.4.5%). CVD is the biggest slice by far, seen increasing to $7.3B, vs. $2.75B for ion implant and $475.4M for MBE. Looking ahead, all three segments should see growth rates rise, led by CVD and ion implant at roughly 10%, with MBE at ~8%.

Note that ion-related materials are the least costly of these technologies, accounting for just 2.5% of that market slice from 2007 through 2013 (vs. ~9%-10% for MBE and CVD and MBE). Ion implant equipment, meanwhile, represents the biggest investment percentagewise over the other deposition areas (~83%-84%, vs. 75%-80% for MBE and CVD). The services component of total is biggest for MBE (~15%), vs. ~14% for ion implant and ~10% for CVD.