SMI develops “highest temperature” oxide MOCVD nanotech tool

May 5, 2008 — Structured Materials Industries (SMI) Inc., which has a history of developing nanolayer processes, says it has received an order for an ultra-high temperature oxide metal-organic chemical vapor deposition (MOCVD) tool. The tool will enable growth of nanoscale-thick oxide films well in environments exceeding 1200 degrees C.

Very high temperatures are needed to realize certain crystalline properties of many oxide materials. By developing a high temperature system, new levels of materials growth capability will be achieved. This, the company hopes, will spur development of new, nanotechnology-based materials. The super high temperature environment also allows the system to uniquely pre-treat samples by degassing, oxygen treating, or even annealing the substrate.

“This project will create a tool for oxide film growers unique to the industry. The ability to access new material phases and to study and implement them will have a dramatic impact on our understanding of the kinetics of high temperature CVD growth of oxides, of how previously unachievable advanced oxide films behave, and, ultimately, how devices made using these advanced films behave,” says SMI CEO and President, Dr. Gary S. Tompa.

SMI is focused on being the leader in MOCVD and related technologies. The company sells systems, components, materials, and process development services. SMI has an in-house applications laboratory featuring multi-reactor deposition systems and analytic capabilities, and has developed a range of strategic partnerships to develop and implement MOCVD technology.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.