June 13, 2008 — OAI, a manufacturer of UV exposure equipment for semiconductor, microfluidics, and nanotechnology, has won the bid from Trinity College, in Ireland, for its Nano Imprint Module, which will be integrated with OAI’s Model 800 optical front and backside mask aligner. Trinity College purchased the Nano Imprint Module for both its R & D and teaching facilities.
OAI’s Nano Imprint Module can be added to any mask aligner. The technology was developed at HP Labs, and OAI announced availability of the module in August 2007.
“We are pleased to work with Trinity College to help them include Nanotechnology in its research and teaching programs,” says Dr. Charles Turk, president of OAI. “The use of the imprint module with the Model 800 Mask Aligner provides a flexible platform for advanced semiconductor lithography, MEM’s, as well as nano imprinting. The changeover from lithography to nano imprinting can be accomplished in less than 15 minutes,” he adds.
The system is scheduled for installation this summer.