Edwards, TEL to make abatement tech for etch

Nov. 26, 2008 – Edwards and Tokyo Electron Ltd. are planning to jointly develop a perfluorocarbon (PFC) gas abatement system, with availability slated for mid-2009.

The PA-01E, incorporating a plasma abatement device developed with Japan’s Adtec Plasma Technology Co., will help reduce PFC pollution resulting from dielectric film etching processes in semiconductor manufacturing; it also will abate carbon monoxide, eliminating the need for additional abatement hardware. The tool also will feature reduced requirements for energy, consumables, and maintenance.

“We look forward to working with TEL’s engineering staff to provide an effective, low cost-of-ownership gas abatement system specifically designed to reduce the dangers of PFC pollution as a result of the semiconductor etch process,” said Nigel Hunton, Edwards’ CEO. in a statement.


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