March 26, 2009: Heidelberg Instruments has announced the sale of an advanced DWL 2000 maskless laser lithography system to the MESA+ Institute for Nanotechnology at the University of Twente in The Netherlands.
The DWL 2000 system will enable the user to expose submicron structures on photoresist, with an active write area of up to 200 mm by 200 mm.
The University Twente is reallocating the buildings for research and education, with the new nanotech lab at the center, according to a university news release. The DWL2000 will be installed for device prototyping to support research and startup companies.
The DWL 2000 laser lithography system. (Image courtesy of Heidelberg)