July 21, 2009 – Continuing progress of the CEA-Leti-led three-year IMAGINE program to explore maskless lithography for the 22nm node and beyond, Mapper Lithography has delivered a “massively parallel” e-beam platform to Leti.
The 300mm 110-beam platform will be upgraded over the next two years toward commercialization levels. The program’s goal is to offer assessment of maskless litho in a manufacturing environment, and to develop and qualify everything from data preparation to process integration. TSMC threw its weight behind the project by joining in early July.
“We are on the way to establishing the potential of the multibeam technology and to offer new promising perspectives to the semiconductor industry,” said Olivier Demolliens, head of Nanotec at CEA-Leti, in a statement.